BENGALURU, India — With design rule checking becoming hugely complex in the deep sub-micron regime, there is a large run time for physical verification tools, for the number of design rules that must ...

IC designers are a lucky bunch. Through many years of semiconductor process evolution, the impact of manufacturing limitations and variations on layout could be encapsulated in relatively simple ...

WILSONVILLE, Ore.--(BUSINESS WIRE)--Mentor Graphics Corporation (NASDAQ:MENT) today announced the release of a major new product in the HyperLynx® suite, the market-leading, high-speed analysis ...

As integrated circuit (IC) designs have grown in complexity, scale and speed requirements, design rule checking (DRC) has evolved from a routine step into a critical pillar of successful tapeouts.

The relationship between a place and route (P&R) application and the collection of system-on-chip (SoC) design implementation, analysis, and verification methodologies and tools has always been very ...

For IC design at the 90- and 65-nm process nodes to be truly successful, the design process needs more predictability built into it in terms of yield. The problem, to a large extent, is that there has ...

The design of AMS circuits requires the adoption of specific recipes, the sharing of past experiences, and a huge number of design explorations with different constraints and parameters. The quality ...