The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...

UB researchers have received a $1 million National Science Foundation (NSF) grant to help fund the purchase of a new 100-kilovolt electron beam lithography (EBL) system. A key addition to UB’s ...

TOKYO--(BUSINESS WIRE)--Advantest Corporation (TSE: 6857, NYSE: ATE) May 19, 2015 - Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge ...

BLOOMINGTON, Minn. & SANTA CLARA, Calif.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT) announced today that it has received from Multibeam Corp., a first-of-a-kind Multicolumn E-Beam ...

SAN JOSE, Calif. &#151 Taking a new approach to a growing problem, startup Multibeam Systems Inc. this week is expected to become the latest company to enter the emerging maskless lithography market.

Southampton, UK --With the exception of Japan, the University of Southampton will be the home to the world’s highest Accelerating Voltage Direct Writing Electron Beam Lithography (EBL) System. The ...

PARIS — STMicroelectronics NV announced it has joined Imagine, a CEA-Leti program focused on electron-beam direct write lithography for IC manufacturing for 22-nm and beyond. Intended to operate for ...

Explore photolithography and lithography tools at the Materials for Opto/Electronics Research and Education (MORE) Center at Case Western Reserve University. Photolithography uses UV sensitive ...

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What is Capillary Force Lithography? Capillary Force Lithography (CFL) is a versatile and cost-effective technique for patterning surfaces at the nanoscale. It leverages the capillary forces arising ...