The confocal sputtering technique involves the arrangement of magnetrons inside a vacuum chamber so that it is possible to apply multiple materials onto the substrate without breaking vacuum. This ...

Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...

The MEGA coating system (multi-source magnetron sputtering system) enables the production of new types of metallic or ceramic coatings in monolithic, graded or multi-layer arrangements using 7 ...

In reactive sputtering process with an Ar + O₂ gas mixture, the plasma emission observed near the cathode changes in appearance. When the oxygen content is high, the plasma exhibits a reddish-violet ...

The state of the target varies with the parameters for the three sputtering modes, and the SMD consists of various voltage-current (V-I) curves at different nitrogen contents and sputtering currents.

CILAS owns one of the largest optical coating platforms in Europe using magnetron sputtering technology. In association with a large cleaning machine using ultrasonic waves, able to process various ...