Nanoscale lithographic technologies have been intensively studied for the development of the next generation of semiconductor manufacturing practices. While mask-less/direct-write electron beam (EB) ...

The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) has published a paper that outlines the lithography roadmap and the various challenges for the next 15 years. The paper, called the ...

A technical paper titled “Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer ...

From its origins more than 200 years ago as an efficient way to publish theatrical works, lithographic printing has grown to be the preferred method for a vast range of print projects. Currently, the ...

As foundries will likely suffer a utilization rate of less than 40% in the first quarter of 2009, orders for new lithography tools are currently limited, according to ...

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